8 Chamber Vacuum Ultrasonic Cleaning System

8 Chamber Vacuum Ultrasonic Cleaning System is matchless cleaning system that removes chemicals, ions and impurities remaining on the implant surface to ensure quality optimized for the patient's oral conditions.

8plant Implant System contains technology that can prevent adverse reactions for stable osseointegration after implant placement.

8plant has an unique cleaning system, which realizes qualified product by significantly lowering the detection value of impurities, including chemical ions that cause side effects and chemicals used in the manufacturing process (surface treatment agents, detergents, etc.).

8plant pursue to products that will satisfy customers for a long-lasting followed by safe and clean implant placement.

EVALUATION OF CLEANING PERFORMANCE

• Residual ion detecion analysis (anion IC, cation ICP)
  : each element 0.5 PPM down
• Cell Toxic Test
  : cell proliferation rate 29% down
• FT-IR(Identification of cleaning residual through infrared spectrum)
  : peak of cleaner used during process should not detect

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Result of Surface Residual Anion

Evaluation Standard	8plant SLA Fixture Result
IC 0.5 PPM down	F	N.D
	CI	0.011
	NO2	N.D
	NO3	0.016
	SO4	0.015
	PO4	N.D

* When detecting ions, NO2, Br, PO4 anions, and heavy metals such as Sn, Ni are not detected within 0.5 PPM (1mg/L).